Acceptable Purposes: PFOS and PFOSF

Notification of acceptable purpose(s) for production and use of PFOS, its salts and PFOS-F

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Notification Form

Register of PFOS, its salts and PFOSF pursuant to paragraph 1 of part III of annex B of the Stockholm Convention

Party Production notifications
(x=received)
Use
notifications
(x=received)
Acceptable purpose activities Chemical name 
of the precursor
(if relevant)
Remarks
Ongoing Planned Ongoing  Planned
Brazil  x    x
Insect baits for control of leaf-cutting ants from Atta spp. and Acromyrmex spp. Perfluorooctane sulphonyl fluoride (PFOS-F) (*) (*) Intermediate in the production of sulfluramid, for the production of insect baits for control of leaf-cutting ants from Atta spp and Acromyrmex spp.
Canada      x  10/12/2010 • Photo-imaging 
• Photo-resist and anti-reflective coatings for semi-conductors
• Etching agent for compound semi-conductors and ceramic filters 
• Aviation hydraulic fluids 
• Metal plating (hard metal plating) only in closed-loop systems 
• Fire-fighting foam 
   
China, People’s Republic of  x    x   • Photo-imaging 
• Photo-resist and anti-reflective coatings for semi-conductors
• Etching agent for compound semi-conductors and ceramic filters 
• Aviation hydraulic fluids 
• Metal plating (hard metal plating) only in closed-loop systems 
• Certain medical devices (such as ethylene tetrafluoroethylene copolymer (ETFE) layers and radio-opaque ETFE production, in-vitro diagnostic medical devices, and CCD colour filters)
• Fire-fighting foam 
  Applicable to Hong Kong SAR and Macau SAR of China
Czech Republic      x   • Photo-imaging;
• Photo-resist and anti-reflective coatings for semi-conductors;
• Aviation hydraulic fluids;
• Metal plating (hard metal plating) only in closed-loop systems
   
European Union  x    x
• Photo-imaging;
• Photo-resist and anti-reflective coatings for semi-conductors;
• Etching agent for compound semi-conductors and ceramic filters;
• Aviation hydraulic fluids;
• Metal plating (hard metal plating) only in closed-loop systems.
  The EU restriction is not limited to PFOS, its salts and PFOS-F but covers all PFOS derivatives defined as C8F17SO2X, X= OH, metal salt (O-M+), halide, amide, and other derivatives including polymers.

Please note that the fire-fighting foams that were placed on the EU market before 27 December 2006 may be used until 27 June 2011.
Japan  x    x   • Photo-imaging;
• Photo-resistant and anti-reflective coatings for semi-conductors;
• Etching agent for compound semi-conductors and ceramic filters;
• Certain medical devices
Perfluotooctane-1-sulfonyl fluoride (PFOS-F, CAS No. 307-.35-7)  
Norway      x   • Photo-imaging;
• Photo-resist and anti-reflective coatings for semi-conductors;
• Etching agent for compound semi-conductors and ceramic filters;
• Aviation hydraulic fluids;
• Metal plating (hard metal plating) only in closed-loop systems.
   
Switzerland      x
• Photo-imaging;
• Photo-resist and anti-reflective coatings for semi-conductors;
• Etching agent for compound semi-conductors and ceramic filters;
• Aviation hydraulic fluids;
• Metal plating (hard metal plating) only in closed-loop systems;
• Fire-fighting foam.
  Although PFOS-based aqueous film forming foams (AFFF5) can no longer be manufactured, or purchased in Switzerland, remaining stocks are allowed to be used in cases of an emergency by fire brigades until 2014 and in stationary installations until 2018.
 Vietnam  x    x   • Photo-imaging;
• Photo-resist and anti-reflective coatings for semi-conductors;
• Etching agent for compound semi-conductors and ceramic filters;
• Aviation hydraulic fluids;
• Metal plating (hard metal plating) only in closed-loop systems;
• Certain medical devices (such as ethylene tetrafluoroethylene copolymer (ETFE) layers and radio-opaque ETFE production, in-vitro diagnostic medical devices, and CCD colour filters);
• Fire-fighting foam;
• Insect baits for control of leaf-cutting ants from Atta spp. and Acromyrmex spp.
• Perfluorooctane sulfonic acid (CAS No: 1763-23-1);
• Potassium perfluorooctane sulfonate (CAS no. 2795-39-3);
• Lithium perfluorooctane sulfonate (CAS no. 29457-72-5);
• Ammonium perfluorooctane sulfonate (CAS no. 29081-56-9);
• Diethanol-ammonium perfluorooctane sulfonate (CAS no. 70225-14-8);
• Tetraethyl-ammonium perfluorooctane sulfonate (CAS no. 56773-42-3);
• Didecyldimethyl-ammonium perfluorooctane sulfonate (CAS no. 251099-16-8)
• Perfluorooctane sulfonyl fluoride (CAS No: 307-35-7).
Vietnam is in the process of PFOS inventory and will update information when available.

 

The Register of Acceptable Purposes for the persistent organic pollutants was amended pursuant to the decision SC - 4/17 of the fourth meeting of the Conference of the Parties, so as to include new acceptable purposes in Annex B of the Convention.

In principle, the amendments to Annexes A, B and C have entered into force on 26 August 2010. However, these amendments may not enter into force with respect to those Parties that: i) have submitted a notification pursuant to the provisions of paragraph 3(b) of Article 22 of the Convention or ii) have made declarations regarding the amendments to the Annexes in accordance with paragraph 4 of article 25 of the Convention.

The table below provides the list of acceptable purposes.

 

Chemical

 

Activity
Acceptable purpose
Perfluorooctane sulfonic acid (CAS No: 1763-23-1), its saltsa and perfluorooctane sulfonyl fluoride
(CAS No: 307-35-7)  [1]

a For example:
potassium perfluorooctane sulfonate
(CAS no. 2795-39-3);
lithium perfluorooctane sulfonate
(CAS no. 29457-72-5);
ammonium perfluorooctane sulfonate
(CAS no. 29081-56-9);
diethanolammonium perfluorooctane sulfonate
(CAS no. 70225-14-8);
tetraethylammonium perfluorooctane sulfonate
(CAS no. 56773-42-3);
didecyldimethylammonium perfluorooctane sulfonate
(CAS no. 251099-16-8).
Production In accordance with part III of Annex B, production of other chemicals to be used solely for the uses below. Production for uses listed below.

 

 Use

In accordance with part III of Annex B for the following acceptable purposes, or as an intermediate in the production of chemicals with the following acceptable purposes:

  • Photo imaging
  • Photo resist and anti-reflective coatings for semi-conductors
  • Etching agent for compound semi-conductors and ceramic filters
  • Aviation hydraulic fluids
  • Metal plating (hard metal plating) only in closed-loop systems
  • Certain medical devices (such as ethylene tetrafluoroethylene copolymer (ETFE) layers and radio-opaque ETFE production, in vitro diagnostic medical devices, and CCD colour filters)
  • Fire fighting foam
  • Insect baits for control of leaf-cutting ants from Atta spp. and Acromyrmex spp.

[1]   Please refer to the definitions as provided in Part III of Annex B of the Convention, for more information.