Acceptable Purposes: PFOS, its salts and PFOSF

Register of Acceptable Purposes on PFOS, its salts and PFOSF pursuant to paragraph 1 of part III of annex B of the Stockholm Convention

By decision SC-9/4, the Conference of the Parties decided to amend Annex B with a new listing, which includes amended specific exemptions and acceptable purposes for perfluorooctane sulfonic acid (PFOS), its salts and perfluorooctane sulfonyl fluoride (PFOSF). These amendments entered into force on 3 December 2020, on expiry of one year from the date of communication by the depositary of the adoption of the amendment, for all Parties that have not submitted a notification of non-acceptance according to paragraph 3 (b) of Article 22. For those Parties that made a declaration pursuant to paragraph 4 of Article 25, the amendment will enter into force on the ninetieth day after deposit of its instrument of ratification, acceptance, approval or accession.

Perfluorooctane sulfonic acid (CAS No 1763-23-1), its salts and perfluorooctane sulfonyl fluoride (CAS No 307-35-7)

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Acceptable purposes under amendment decision SC-9/4 (from 3 December 2020 onwards)

Party Production notifications
(x=received)
Use
notifications
(x=received)
Acceptable purpose activities Chemical name 
of the precursor
(if relevant)
Date of notification Remarks
Ongoing Planned Ongoing Planned
Brazil  - From September 2020  X •  Insect baits with sulfluramid (CAS No. 4151-50-2) as an active ingredient for control of leaf cutting ants from Atta spp. and Acromyrmex spp. for agricultural use only. Perfluorooctane sulphonyl fluoride (PFOS-F) (CAS. No. 307-35-7)  27/11/2020 Used as an intermediate in the production of insect baits with sulfluramid for the control of leaf-cutting ants from Atta spp. and Acromyrmex spp. for agricultural use only.
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Acceptable purposes under decision SC-4/17 (status until 3 December 2020)

Party Production notifications
(x=received)
Use
notifications
(x=received)
Acceptable purpose activities Chemical name 
of the precursor
(if relevant)
Date of notification Remarks
Ongoing Planned Ongoing Planned
Canada      X  10/12/2010 • Photo-imaging 
• Photo-resist and anti-reflective coatings for semi-conductors
• Etching agent for compound semi-conductors and ceramic filters 
• Aviation hydraulic fluids 
• Metal plating (hard metal plating) only in closed-loop systems 
• Fire-fighting foam 
   21/12/2010  
China, People’s Republic of  X    X   • Photo-imaging 
• Photo-resist and anti-reflective coatings for semi-conductors
• Etching agent for compound semi-conductors and ceramic filters 
• Aviation hydraulic fluids 
• Metal plating (hard metal plating) only in closed-loop systems 
• Certain medical devices (such as ethylene tetrafluoroethylene copolymer (ETFE) layers and radio-opaque ETFE production, in-vitro diagnostic medical devices, and CCD colour filters)
• Fire-fighting foam 
   18/03/2014 Applicable to Hong Kong SAR and Macau SAR of China
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Archived acceptable purposes (Parties for which amendment entered into force)

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Withdrawal from the PFOS Register